Effect of pulsed bias power on electron density modulation in inductively coupled plasma

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0275598
Affiliations:
4
Authors:
7
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Institutions Authors Share
SK Hynix Inc., South Korea
3.000000
 0.43
Korea Research Institute of Standards and Science (KRISS), South Korea
2.500000
 0.36
Korea Aerospace University (KAU), South Korea
1.500000
 0.21
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