Plasma damage-free iin situ/i etching of β-Ga2O3 using solid-source gallium in the LPCVD system

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0277909
Affiliations:
1
Authors:
3
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Institutions Authors Share
University of Massachusetts Lowell (UMass Lowell), United States of America (USA)
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