Strain engineering of photoinduced anomalous Hall effect in topological insulator Sb2Te3
- Journal:
- Applied Physics Letters
- Published:
- DOI:
- 10.1063/5.0279026
- Affiliations:
- 6
- Authors:
- 9
| Institutions | Authors | Share |
|---|---|---|
| Fuzhou University (FZU), China | 0.39 | |
| State Key Laboratory of Low-Dimensional Quantum Physics, Tsinghua, China | 0.22 | |
| Maynooth University, Ireland | 0.11 | |
| Changzhou University (CZU), China | 0.11 | |
| Institute of Semiconductors (IOS), CAS, China | 0.11 | |
| Fujian Newland Payment Technology, China | 0.06 |