Ultralow-Ohmic-contact resistance of Ni/Ag/NiO on p++-GaN/p-GaN/AlGaN/GaN platform

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0281033
Affiliations:
4
Authors:
14
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Institutions Authors Share
University of Liverpool, United Kingdom (UK)
7.500000
 0.54
Xi'an Jiaotong - Liverpool University (XJTLU), China
5.500000
 0.39
Institute of Microelectronics (IME), CAS, China
1.000000
 0.07
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