Pulsed mode atomic layer etching of ScAlN using Cl2/C2H4/Ar

Journal:

Applied Physics Letters

Published:

2025-08-19

DOI:

10.1063/5.0282582

Affiliations:

3

Authors:

14

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Institutions	Authors	Share
Institute of Microelectronics (IME), CAS, China	10.500000 10.500000	0.75
University of Chinese Academy of Sciences (UCAS), China	2.500000	0.18
Institute of Semiconductors (IOS), CAS, China	1.000000	0.07

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