Sub-nanometer ZrO2 capping Hf0.5Zr0.5O2 thin films for BEOL-compatible ferroelectric tunnel junction with giant electroresistance

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0284014
Affiliations:
1
Authors:
4
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Institutions Authors Share
Hebei University (HBU), China
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