ALD-derived high-ik/i ZrAlOx dielectrics for boosted performance of CNTs/ZTO CMOS inverter

Journal:

Applied Physics Letters

Published:

2025-08-23

DOI:

10.1063/5.0284286

Affiliations:

5

Authors:

7

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Institutions	Authors	Share
Shanghai University (SHU), China	3.000000	0.43
Zaozhuang College, China	1.000000	0.14
Southwest University of Science and Technology (SWUST), China	1.000000	0.14
AVIC Shenyang Aircraft Corporation, China	1.000000	0.14
MOE Key Laboratory of Advanced Display and System Applications, SHU, China	1.000000	0.14

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