Formation and relief of epitaxial strain in ultra-thin α-(Al,Ga)2O3 films on a-plane sapphire under biaxial stress

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0294624
Affiliations:
2
Authors:
3
Institutions Authors Share
Paul Drude Institute for Solid State Electronics (PDI), Germany
1.500000
0.50
Leibniz-Institut für Kristallzüchtung im Forschungsverbund Berlin e.V. (IKZ), Germany
1.500000
0.50