A mechanism of defect creation in amorphous Ta2O5

Journal:: Applied Physics Letters
Published:: 2026-02-02
DOI:: 10.1063/5.0300685
Affiliations:: 4
Authors:: 6

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Institutions	Authors	Share
UCL, United Kingdom (UK)	2.500000	0.42
Sandia National Laboratories, United States of America (USA)	2.000000	0.33
M2D Solutions, United States of America (USA)	1.000000	0.17
Nanolayers Research Computing Ltd., United Kingdom (UK)	0.500000	0.08

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