Fabrication of robust suspended structures using tilted e-beam lithography

Journal:

Applied Physics Letters

Published:

2025-12-15

DOI:

10.1063/5.0303408

Affiliations:

3

Authors:

5

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Institutions	Authors	Share
The Ohio State University (OSU), United States of America (USA)	3.000000	0.60
Research Center for Electronic and Optical Materials, NIMS, Japan	1.000000	0.20
WPI International Center for Materials Nanoarchitectonics (WPI-MANA), NIMS, Japan	1.000000	0.20

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