Pressure-controlled growth and mechanism of monolayer WSe2 via NaCl-assisted CVD

Journal:

Applied Physics Letters

Published:

2026-01-19

DOI:

10.1063/5.0305921

Affiliations:

4

Authors:

7

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Institutions	Authors	Share
Hebei University of Technology (HEBUT), China	5.500000	0.79
Hebei Semiconductor Research Institute (CETC13), China	1.000000	0.14
State Key Laboratory of Reliability and Intelligence of Electrical Equipment, HEBUT, China	0.500000	0.07

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