Stacking-engineering magnetoelectric coupling effects in van der Waals type-I multiferroics

Journal:
Applied Physics Letters
Published:
DOI:
10.1063/5.0307981
Affiliations:
4
Authors:
4
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Institutions Authors Share
Institute of Microelectronics (IME), CAS, China
2.333333
 0.58
MOE Key Laboratory of Weak Light Nonlinear Photonics, NKU, China
1.000000
 0.25
University of Chinese Academy of Sciences (UCAS), China
0.666667
 0.17
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