Orientation-tunable local crystallization of Si films enabled by atomic imprint crystallization

Journal:: Applied Physics Letters
Published:: 2026-03-30
DOI:: 10.1063/5.0323109
Affiliations:: 2
Authors:: 5

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Institutions	Authors	Share
The University of Chicago (UChicago), United States of America (USA)	3.000000	0.60
Materials Science Division (MSD), ANL, United States of America (USA)	2.000000	0.40

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