Effects of gate-electrode plasmons on remote phonon scattering in thin-film transistor with perovskite barium titanate as high-k gate dielectric
- Journal:
- Applied Physics Letters
- Published:
- DOI:
- 10.1063/5.0329462
- Affiliations:
- 2
- Authors:
- 5
| Institutions | Authors | Share |
|---|---|---|
| The University of Hong Kong (HKU), China | 0.60 | |
| Huazhong University of Science and Technology (HUST), China | 0.40 |