Antiferroelectricity in BiFeO3 Thin Films

Journal:: Physical Review Letters
Published:: 2025-11-12
DOI:: 10.1103/fqpx-dpbn
Affiliations:: 3
Authors:: 4

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Institutions	Authors	Share
Soochow University, China	2.000000	0.50
University of Arkansas (UARK), United States of America (USA)	1.500000	0.38
Tel Aviv University (TAU), Israel	0.500000	0.13

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