In situ straining of epitaxial freestanding ferroic films by a microelectromechanical device

Journal:

Physical Review B

Published:

2026-04-03

DOI:

10.1103/pj3y-qfvb

Affiliations:

6

Authors:

13

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Institutions	Authors	Share
Paul Scherrer Institute (PSI), Switzerland	5.500000	0.42
Polytechnic University of Milan, Italy	3.000000	0.23
National Cheng Kung University (NCKU), Taiwan	3.000000	0.23
Swiss Federal Institute of Technology Zurich (ETH Zurich), Switzerland	1.000000	0.08
Max-Born-Institute for Nonlinear Optics and Short Pulse Spectroscopy (MBI), Germany	0.500000	0.04

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