Polytelluoxane as the ideal formulation for EUV photoresist

Journal:

Science Advances

Published:

2025-07-18

DOI:

10.1126/sciadv.adx1918

Affiliations:

4

Authors:

5

Go to article

Institutions	Authors	Share
MOE Key Laboratory of Organic Optoelectronics and Molecular Engineering, Tsinghua, China	3.500000	0.70
Jiangnan University, China	0.500000	0.10
Beijing Advanced Innovation Center for Integrated Circuits, China	0.500000	0.10
Tsinghua University, China	0.500000	0.10

Interested in Nanotechnology?