A bis(tert-butyl) isophthalate (B-IP) was utilized as a dissolution inhibitor in chemically amplified three-components resist. In extreme ultraviolet (EUV) exposed area, tert-butyl groups of B-IP were decomposed by the effect of protons generated from photo-acid generator, and B-IP was converted to a carboxylic acid, being played a role of dissolution promoter. Furthermore, B-IP was acted as a plasticizer in the resist and the protons were diffused through the resist easily. The resist containing B-IP was improved its sensitivity and dissolution contrast, although the properties are a relation of trade-off.
- Hideo Horibe
- Keita Ishiguro
- Seiichi Tagawa
