Using a three-pronged approach — spanning field-driven negative capacitance stabilization to increase intrinsic energy storage, antiferroelectric superlattice engineering to increase total energy storage, and conformal three-dimensional deposition to increase areal energy storage density — very high electrostatic energy storage density and power density are reported in HfO2–ZrO2-based thin film microcapacitors integrated into silicon.
- Suraj S. Cheema
- Nirmaan Shanker
- Sayeef Salahuddin