Nanomanufacturing

Nanomanufacturing encompasses a suite of techniques for constructing, patterning and assembling structures with features on the scale of 1–100 nm, integrating top-down lithographic methods with bottom-up approaches such as self-assembly and electrodeposition. By harnessing advanced processing tools—atomic layer deposition (ALD), nanoimprint lithography, femtosecond-laser writing and electrochemical patterning—researchers achieve atomic-level thickness control, sub-10 nm resolution and high-aspect-ratio architectures over wafer-scale areas. Key challenges include precise regulation of interfacial phenomena, minimisation of surface-induced defects and scaling from laboratory prototypes to continuous, high-throughput production. These efforts underpin progress in semiconductors, flexible electronics, photonics, energy devices and biosensors, where nanoscale precision directly translates into enhanced device performance, reduced material usage and new functionality. Ongoing research addresses the interplay between process parameters and materials physics, forging robust pathways from fundamental surface chemistry to manufacturable nanostructures with global technological significance.

Research from Nature Portfolio

Recent work on area-selective atomic layer deposition has demonstrated sub-10 nm patterning without conventional masks by exploiting lateral superlattice templates of MoS₂–MoSe₂ domains. By tuning precursor adsorption and in-plane diffusion, researchers achieved selective growth of oxides, metals and semiconductors on centimetre-scale substrates with half-pitch below 10 nm, opening avenues for ultra-dense device integration without photomasks or etch-back steps.

Another breakthrough employs direct in situ photolithography of perovskite quantum dots, in which lead-halide complexes catalyse photopolymerisation within precursor films. Upon ultraviolet exposure, patterned perovskite nanocrystals form only in illuminated regions, yielding pixel densities above 2 400 PPI and photoluminescence uniformity without lift-off damage. This method bypasses conventional resist-based patterning and consolidates nanocrystal synthesis with high-resolution pattern definition.

Research from all publishers

A transferable alumina membrane acting as a high-κ gate dielectric has been fabricated by atomic layer deposition on a reusable carrier, then wet-transferred onto flexible graphene transistors. The resulting membrane exhibits low leakage, high breakdown field and robust performance under bending, illustrating a route to low-temperature, large-area flexible device manufacture.

Separately, resistive-switching devices combining ozone-assisted ALD SiO₂, graphene interlayers and plasma-enhanced ALD HfO₂ demonstrate enhanced endurance and lower switching voltages compared with oxide-only stacks. The graphene layer preserves structural integrity during oxide deposition and contributes to controllable filament formation, showcasing a hybrid electrochemical-deposition approach for neuromorphic and memory-cell manufacturing.

Nanomanufacturing publication trend

The graph below shows the total number of articles in nanomanufacturing across all publications each year (not limited to Nature Index journals).

Technical terms

Nanoimprint lithography: A fabrication method in which a rigid or flexible mould bearing nanoscale features is pressed into a resist or polymer to replicate structures by mechanical deformation.

Electrowetting: Modulation of a liquid’s contact angle on a surface via an applied electric field, enabling near-zero-pressure filling of nanoscale cavities.

Atomic layer deposition (ALD): A vapour-phase technique that deposits conformal films one atomic layer at a time through sequential, self-limiting surface reactions.

Contact potential: The electric potential established at the interface of two materials with different work functions when they are placed in contact, driving local electrochemical reactions.

Electrochemical nanoimprint lithography (ECNL): A direct imprinting strategy that uses contact potential-induced electrochemical etching to transfer three-dimensional patterns into semiconductor surfaces without resist or mask.

References

1. Area-selective atomic layer deposition on 2D monolayer lateral superlattices. Nature Communications (2024).
2. Direct in situ photolithography of perovskite quantum dots based on photocatalysis of lead bromide complexes. Nature Communications (2022).
3. Transferrable Alumina Membranes as High‐Performance Dielectric for Flexible 2D Materials Devices. Advanced Electronic Materials (2024).